The MATS sources generate an inductively coupled plasma to dissociate various gases that include nitrogen, oxygen, hydrogen and other molecular gases. Using RF (13.56MHz) powered coil, the energy is transferred to the plasma, which results in a "soft" plasma that has minimal ion energy.
The MATS sources deliver high volume flux of electrostatically neutral atoms that are excellent for epitaxial growth of nitrides and oxides. The radicals are highly reactive and have a low kinetic energy and will not damage the epitaxial structure. A small amount of ions are generated in the process, but MATS sources can be equipped with charge deflection plates to ensure that the flux reaching the substrate is neutral.
The RFM utilise Mantis Deposition's extensive knowledge of plasma technology. By generating an inductively coupled plasma and applying a high voltage to source's exit grids, the RFM delivers a range of ion current and energies. The RFM is capable of delivering a current of up to 6mA/cm2 and beam energies ranging from 0.1keV to more than 1keV.
The MGC-75 gas cracker uses a proprietary, capillary cracking tube to efficiently dissociate molecular gases at relatively low temperatures. Fitted on a standard NW35CF flange the source can be fitted to almost any vacuum chamber. It can be used with a variety of gases including hydrogen, oxygen, ammonia, chlorine, fluorine and other gases. Ideal for flow rates of 0 to 1 sccm, the catalytic cracking mechanism delivers above 90% cracking efficiency of diatomic hydrogen with only 75W of power and less than 1000°C. The cracking mechanism delivers an ion free flux that eliminates substrate damage that occurs with other cracking methods.
A dedicated sample stage is a very useful additon to any deposition system. It allows the operator to introduce the sample into the vacuum system with minimal preparation and effort. Furthermore, it ensures that the coatings are uniform, reproducible and the deposition process can be enhanced by extra supplied functionality of the stage.
We manufacture a range of sample stages which is designed to support a variety of PVD processes. The sample stages have many standard functional features such as rotation and heating, and in addition, we may offer a custom solution for your sample size and temperature range.
produce a perfect fit for every system.