鍍源設備 EVAPORATOR KCELL
Electron beam evaporation is employed to provide a vapour stream from materials commonly difficult to evaporate with standard thermal techniques. An energetic electron beam is targeted onto the source material which has the effect of increasing the temperature. The sources can be used to heat the target material to temperatures in excess of 3000°C (if in rod form) and have an unprecedented control over the temperature range between 200°C and 3000°C.
The ComCell effusion cell series are designed for high-purity, high-precision evaporation of materials in MBE or hybrid UHV applications.
The ComCell sources are used in research type deposition systems for sample preparation, thin film growth and MBE applications. ComCells can be tailored to the different material requirements with a hot lip or a cold lip.
The ComCells are ideally suited for elements and compounds that require operation temperatures between 500°C and 1300°C.
ComCells can also be used as doping sources and are therefore equipped with conical crucibles.